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Phone：+86 17062388866Description
The Applied Materials (AMAT) 0100-71267 is a high-accuracy Mass Flow Controller (MFC) engineered for critical gas delivery in semiconductor manufacturing. As a core component in AMAT’s process tool ecosystems, it enables nanoscale precision in deposition, etch, and implantation processes by dynamically regulating gas flows from 0.5 to 20 SLM (Standard Liters per Minute). The 0100-71267 utilizes thermal sensor technology with proprietary compensation algorithms to achieve ±0.8% setpoint stability, ensuring wafer-to-wafer uniformity at advanced nodes. Constructed with corrosion-resistant Hastelloy C-22 and electropolished wetted surfaces (Ra <10>
AMAT 0100-71267
Technical Specifications
| Parameter Name | Parameter Value |
| Product Model | 0100-71267 |
| Manufacturer | Applied Materials (AMAT) |
| Product Type | Mass Flow Controller (MFC) |
| Flow Range | 0.5–20 SLM (N₂ calibrated) |
| Accuracy | ±0.8% of full scale |
| Repeatability | ±0.2% of reading |
| Response Time | <1> |
| Max. Inlet Pressure | 100 psig (6.9 bar) |
| Leak Rate | <1> |
| Wetted Materials | Hastelloy C-22, Viton® seals |
| Communication Protocol | CANopen (DS301/DS302) |
| Operating Temperature | 15°C to 45°C |
| Calibration Gases | N₂, Ar, O₂, H₂, He |
| Certifications | SEMI F20, CE, RoHS |
Main Features and Advantages
Atomic-Level Process Control: Proprietary thermal compensation maintains ±0.25% stability during rapid thermal transients (<100>
Contamination-Free Design: Electropolished flow paths and high-purity seals reduce particle generation by 90% versus industry standards. Optional passivation (e.g., Ni-PTFE) supports corrosive gases like Cl₂, BCl₃, and WF₆.
Predictive Diagnostics: Embedded health monitors track valve seat wear, thermal drift, and calibration shifts. CANopen SDOs (Service Data Objects) provide early fault alerts, reducing unplanned tool downtime.
Plug-and-Play Integration: Pre-loaded calibration for 28 gases and automatic recognition in AMAT’s FabOS® MES slash commissioning time. Backward-compatible with AMAT Gas Delivery Systems (GDS) via adapter kits.
AMAT 0100-71267
Application Field
The AMAT 0100-71267 dominates semiconductor processes demanding sub-angstrom gas control:
Logic/DRAM Fabrication: Manages SiH₄/N₂O ratios for <5>
Compound Semiconductors: Controls NH₃ flows for GaN epitaxy in MicroLED production with ±1% uniformity.
Advanced Packaging: Precisely doses C₄F₈ for TSV (Through-Silicon Via) etching in chiplets.
Solar/PV Manufacturing: Regulates B₂H₆ doping gases for PERC cell efficiency >23%.
R&D Facilities: Enables AI-driven process optimization via real-time OPC UA data streaming.
Related Products
AMAT 0100-90310: High-flow MFC (50–200 SLM) for chamber purges
AMAT 0190-19065: Gas Valve Manifold for multi-zone 0100-71267 integration
AMAT 0030-35729: Pressure Transducer for closed-loop flow validation
AMAT 0100-00841: CANopen/Ethernet gateway for legacy tools
AMAT 0040-13830: Heated gas line kit for condensation prevention
Installation and Maintenance
Pre-installation preparation: Verify gas compatibility using AMAT’s Gas DataPro® software. Purge lines to O₂ <10>
Maintenance recommendations: Perform quarterly NIST-traceable calibration checks. Replace Viton® seals every 18 months in corrosive environments. Monitor “Valve Stroke Count” via CANopen—schedule rebuilds at 500k cycles. Never exceed 150% rated pressure.
